| Material Source
|
1kW DC Magnetron (power supply incl.). Takes 2" diameter targets.
|
| Deposition rate*
|
<0.001nm/s to ~0.5nm/s
|
Mean cluster sizes*
|
<0.4nm to ~10nm in diameter
|
Ar flow rate required*
|
10-100sccm
|
Beam diameter**
|
5mm to 40mm at a source-sample distance of 100mm
|
Aggregation length
|
variable
|
| Source mounting
|
NW150CF or to customer requirement
|
Services Required
|
500l/s differential pumping, 1000l/s pumping on deposition chamber. liq. Nitrogen, Ar gas, up to 2 aggregation gases
|
|
*Measurements for Cu using NC200U. Values will depend on material and source parameters. ** Depends on aperture set.
|