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	NC200U: High Utilisation Magnetic Targets The NC200U nanocluster source uses a modified magnetron sputtering device to generate the vapour feedstock, which subsequently condenses into nanoparticles. One drawback to the use of magnetron sputtering devices is the difficulty encountered when sputtering magnetic targets. The effect of the magnetic field is reduced, leading to severe under-utilisation of the target material and weak sputtering. Oxford Applied Research has now teamed up with the UK -based company Gencoa to apply their patent pending Loop technology to our magnetron design. This technology uses the magnetic properties of the target material to shape the field lines across the face of the source. This shaping allows a more uniform sputtering pattern to be achieve, greatly enhancing both the rate of cluster deposition and target utilisation as well as enabling the use of thicker targets.Magnetic nanoclusters excite particular interest in the research community due to the potential for application in data storage and devices relying on the GMR effect. For information on Gencoa
Last updated: 23rd July 2010 Copyright 2008 The Vacutec Group Home About Us News Conferences Contact Technical Support